Max Planck Institute for Chemical Physics of Solids - Library Catalog

Principles of chemical vapor deposition [what's going on inside the reactor] by Daniel M. Dobkin and Michael K. Zuraw

Contributor(s): Material type: TextTextLanguage: English Publisher: Dordrecht [u.a.] Kluwer Acad. Publ. c 2003Description: XI, 273 S. Ill., graph. Darst. 25 cmContent type:
  • Text
Media type:
  • ohne Hilfsmittel zu benutzen
Carrier type:
  • Band
ISBN:
  • 1402012489
Subject(s): DDC classification:
  • 671.735
LOC classification:
  • TS695
Other classification:
  • ZM 7680
  • 52.78
Online resources: Action note:
  • 3
  • 1
  • Potenzieller Alleinbesitz Niedersachsen
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Holdings
Item type Current library Call number Materials specified Status Date due Barcode
Buch MPI CPfS UP 7550 PRIN (Browse shelf(Opens below)) Available 10001067

Literaturangaben

Archivierung prüfen 20200919 DE-640 3 pdager

Archivierung prüfen 20240324 DE-4165 1 pdager

Archivierung/Langzeitarchivierung gewährleistet 20240722 NI-LastCopies Potenzieller Alleinbesitz Niedersachsen pdager DE-89

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