Normal view MARC view ISBD view

Principles of chemical vapor deposition [what's going on inside the reactor]

Principles of chemical vapor deposition [what's going on inside the reactor] by Daniel M. Dobkin and Michael K. Zuraw - XI, 273 S. Ill., graph. Darst. 25 cm

Literaturangaben

ISBN: 1402012489

Standard No.: 9781402012488

LCCN: 2003047499

Nat. Bib. Agency Control No.: bA334942 UK

Subjects--Topical Terms:
Vapor-plating
Refractory coating

LC Class. No.: TS695

Dewey Class. No.: 671.735

Print
Add to your cart (remove)
Suggest for purchase
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Andere Bibliotheken (WorldCat) Google Scholar Online-Buchhandel (Bookfinder.com)

Max Planck Institute for Chemical Physics of Solids - Library Catalog

Principles of chemical vapor deposition [what's going on inside the reactor]