Max Planck Institute for Chemical Physics of Solids - Library Catalog

Chemical vapour deposition precursors, processes and applications edited by Anthony C. Jones (Department of Chemistry, University of Liverpool, Liverpool, UK) and Michael L. Hitchman (Thin Film Innovations Limited, Glasgow, UK)

Contributor(s): Material type: TextTextLanguage: English Publisher: Cambridge RSC Publishing [2009]Copyright date: © 2009Description: xv, 582 Seiten Illustrationen, Diagramme 25 cmContent type:
  • Text
Media type:
  • ohne Hilfsmittel zu benutzen
Carrier type:
  • Band
ISBN:
  • 0854044655
  • 9780854044658
Subject(s): Genre/Form: Additional physical formats: No title; Erscheint auch als: Chemical vapour deposition; Erscheint auch als: Chemical vapour depositionDDC classification:
  • 671.735 22
LOC classification:
  • TS695
Other classification:
  • UP 7550
  • 35.13
Online resources: Action note:
  • 1
  • Potenzieller Alleinbesitz Niedersachsen
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Holdings
Item type Current library Call number Materials specified Status Date due Barcode
Buch MPI CPfS ZM 7680 CHEM (Browse shelf(Opens below)) Available 10006255

Literaturangaben

Archivierung prüfen 20240324 DE-4165 1 pdager

Archivierung/Langzeitarchivierung gewährleistet 20240722 NI-LastCopies Potenzieller Alleinbesitz Niedersachsen pdager DE-89

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