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Chemical vapour deposition precursors, processes and applications

Chemical vapour deposition precursors, processes and applications edited by Anthony C. Jones (Department of Chemistry, University of Liverpool, Liverpool, UK) and Michael L. Hitchman (Thin Film Innovations Limited, Glasgow, UK) - xv, 582 Seiten Illustrationen, Diagramme 25 cm

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ISBN: 0854044655 hbk. : £149.00 9780854044658 hbk. : £149.00

Standard No.: 9780854044658

LCCN: 2009419379

Nat. Bib. Agency Control No.: 014702512 UK

Subjects--Topical Terms:
Chemical vapor deposition

Index Terms--Genre/Form:
Aufsatzsammlung
Aufsatzsammlung

LC Class. No.: TS695

Dewey Class. No.: 671.735

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Max Planck Institute for Chemical Physics of Solids - Library Catalog

Chemical vapour deposition precursors, processes and applications