Chemical vapour deposition precursors, processes and applications edited by Anthony C. Jones (Department of Chemistry, University of Liverpool, Liverpool, UK) and Michael L. Hitchman (Thin Film Innovations Limited, Glasgow, UK)
Material type:
- Text
- ohne Hilfsmittel zu benutzen
- Band
- 0854044655
- 9780854044658
- 671.735 22
- TS695
- UP 7550
- 35.13
- 1
- Potenzieller Alleinbesitz Niedersachsen
Item type | Current library | Call number | Materials specified | Status | Date due | Barcode | |
---|---|---|---|---|---|---|---|
Buch | MPI CPfS | ZM 7680 CHEM (Browse shelf(Opens below)) | Available | 10006255 |
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ZM 7605 SURF Surface analysis the principal techniques | ZM 7605 SURF Surface analysis by Auger and X-ray photoelectron spectroscopy | ZM 7670 INTE International Symposium on High Power Laser Ablation 2010 Santa Fe, New Mexico; 18 - 22 April 2010 | ZM 7680 CHEM Chemical vapour deposition precursors, processes and applications | ZM 7680 HEIM Plasma-spray coating principles and applications | ZM 8130 AMME Metalcasting | ZM 8130 AMME The complete handbook of sand casting |
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