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Principles of chemical vapor deposition [what's going on inside the reactor] by Daniel M. Dobkin and Michael K. Zuraw

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Material type: Text

TextLanguage: English Publisher: Dordrecht [u.a.] Kluwer Acad. Publ. c 2003Description: XI, 273 S. Ill., graph. Darst. 25 cmContent type:

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Holdings
Item type	Current library	Call number	Materials specified	Status	Date due	Barcode
Buch	MPI CPfS	UP 7550 PRIN (Browse shelf(Opens below))		Available		10001067

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Previous	UP 7550 ELEC Electrochemistry of nanomaterials	UP 7550 HAND Handbook of sputter deposition technology fundamentals and applications for functional thin films, nano-materials and MEMS	UP 7550 PIER Handbook of chemical vapor deposition (CVD) principles, technology, and applications	UP 7550 PRIN Principles of chemical vapor deposition [what's going on inside the reactor]	UP 7550 VAPO Vapor deposition	UP 7560 ZHIG The physical properties of thin metal films	UP 7630 INTE Interaction of atoms and molecules with solid surfaces	Next

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