Max Planck Institute for Chemical Physics of Solids - Library Catalog

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Principles of chemical vapor deposition [what's going on inside the reactor] by Daniel M. Dobkin and Michael K. Zuraw by
Material type: Text Text; Format: print
Language: English Publisher: Dordrecht [u.a.] Kluwer Acad. Publ. c 2003
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Availability: Items available for loan: MPI CPfS (1)Call number: UP 7550 PRIN.
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Handbook of chemical vapor deposition (CVD) principles, technology, and applications by Hugh O. Pierson by
Edition: 2. ed.
Material type: Text Text; Format: print
Language: English Publisher: Norwich, NY Noyes Publ. 1999
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Availability: Items available for loan: MPI CPfS (1)Call number: UP 7550 PIER.
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