Finden Sie nicht was Sie suchen? Machen Sie einen Anschaffungsvorschlag

Your search returned 4 results.

Results
		Chemical vapour deposition precursors, processes and applications edited by Anthony C. Jones (Department of Chemistry, University of Liverpool, Liverpool, UK) and Michael L. Hitchman (Thin Film Innovations Limited, Glasgow, UK) by Jones, Anthony C [HerausgeberIn] Hitchman, Michael L [HerausgeberIn] Material type: Text; Format: print Language: English Publisher: Cambridge RSC Publishing [2009]Copyright date: © 2009 Online resources: Cover Inhaltsverzeichnis Availability: Items available for loan: MPI CPfS (1)Call number: ZM 7680 CHEM. Add to cart (remove)
		Physics and applications of CVD diamond Satoshi Koizumi ... by Koizumi, Satoshi [Hrsg.] Material type: Text; Format: print Language: English Publisher number: 1140801 000 Publisher: Weinheim Wiley-VCH-Verl. 2008 Online resources: Inhaltstext Inhaltsverzeichnis Cover Availability: Items available for loan: MPI CPfS (1)Call number: UQ 8220 PHYS. Add to cart (remove)
		Handbook of chemical vapor deposition (CVD) principles, technology, and applications by Hugh O. Pierson by Pierson, Hugh O, 1940- [aut] Edition: 2. ed. Material type: Text; Format: print Language: English Publisher: Norwich, NY Noyes Publ. 1999 Online resources: Verlagsangaben Inhaltsverzeichnis Availability: Items available for loan: MPI CPfS (1)Call number: UP 7550 PIER. Add to cart (remove)
		The chemistry of metal CVD ed. by Toivo T. Kodas ... by Kodas, Toivo [Hrsg.] Material type: Text; Format: print Language: English Publisher: Weinheim New York Basel Cambridge Tokyo VCH 1994 Other title: The chemistry of metal CVD / T. Kodas ; M. Hampden-Smith Online resources: Inhaltsverzeichnis Availability: Items available for loan: MPI CPfS (1)Call number: UP 7550 CHEM. Add to cart (remove)

Not finding what you're looking for?

Make a purchase suggestion

Data Protection Advice

© 2023 MPI CPfS / GWDG

Powered by Koha